The Si3N4/TiN Interface: An Introduction to a Series of Ultrathin Films Grown and Analyzed In situ using X-ray Photoelectron Spectroscopy

Authors

Richard T. Haasch, University of Illinois at Urbana-Champaign
Jörg Patscheider, University of Illinois at Urbana-ChampaignFollow
Niklas Hellgren, University of Illinois at Urbana-ChampaignFollow
Ivan Petrov, University of Illinois at Urbana-ChampaignFollow
J. E. Greene, University of Illinois at Urbana-ChampaignFollow

Document Type

Article

Publication Date

12-1-2012

Comments

Originally published as:

Haasch, R. T., Patscheider, J., Hellgren, N., Petrov, I., & Greene, J. E. (2012). The si ₃ n ₄ /tin interface: An introduction to a series of ultrathin films grown and analyzed in situ using x-ray photoelectron spectroscopy. Surface Science Spectra, 19(1), 30–32. https://doi.org/10.1116/11.20121108

Recommended Citation

Haasch, Richard T.; Patscheider, Jörg; Hellgren, Niklas; Petrov, Ivan; and Greene, J. E., "The Si3N4/TiN Interface: An Introduction to a Series of Ultrathin Films Grown and Analyzed In situ using X-ray Photoelectron Spectroscopy" (2012). Educator Scholarship & Departmental Newsletters. 92.
https://mosaic.messiah.edu/mps_ed/92