Title

Anisotropies in magnetron sputtered carbon nitride thin films

Authors

Niklas Hellgren, Linköpings universitetFollow
Mats P. Johansson, Linköpings universitetFollow
Esteban Broitman, Linköpings universitetFollow
Lars Hultman, Linköpings universitetFollow
Jan Eric Sundgren, Linköpings universitetFollow

Document Type

Article

Publication Date

4-30-2001

Abstract

Carbon nitride CNx (O≤x≤0.35) thin films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges have been studied with respect to microstructure using electron microscopy, and elastic modulus using nanoindentation and surface acoustic wave analyses. For growth temperature of 100°C, the films were amorphous, and with an isotropic Young's modulus of ∼170-200 GPa essentially unaffected by the nitrogen fraction. The films grown at elevated temperatures (350-550°C) show anisotropic mechanical properties due to a textured microstructure with standing basal planes, as observed from measuring the Young's modulus in different directions. The modulus measured in the plane of the film was ∼60-80 GPa, while in the vertical direction the modulus increased considerably from ∼25 to ∼200 GPa as the nitrogen content was increased above ∼15 at. %. © 2001 American Institute of Physics.

Comments

Originally published as:

Hellgren, N., Johansson, M. P., Broitman, E., Hultman, L., & Sundgren, J.-E. (2001). Anisotropies in magnetron sputtered carbon nitride thin films. Applied Physics Letters, 78(18), 2703–2705. https://doi.org/10.1063/1.1369388

Recommended Citation

Hellgren, Niklas; Johansson, Mats P.; Broitman, Esteban; Hultman, Lars; and Sundgren, Jan Eric, "Anisotropies in magnetron sputtered carbon nitride thin films" (2001). Educator Scholarship & Departmental Newsletters. 117.
https://mosaic.messiah.edu/mps_ed/117