Structural, electrical, and optical properties of diamondlike carbon films deposited by dc magnetron sputtering

Document Type

Letter to the Editor

Publication Date

11-1-2003

Abstract

The electrical and optical properties of diamondlike carbon films deposited by direct current magnetron sputtering on Si substrates at room temperature have been measured as a function of the ion energy (Eion) and ion-to-carbon flux (Jion/JC). The results show that, in the ranges of 5 eV⩽Eion⩽85 eV and 1.1⩽Jion/JC⩽6.8, the presence of defective graphite formed by subplanted C and Ar atoms, voids, and the surface roughness, are the dominant influences on the resistivity and optical absorption. The electrical and optical properties of diamondlike carbon films deposited by direct current magnetron sputtering on Si substrates at room temperature have been measured as a function of the ion energy (Eion)">(Eion)(Eion) and ion-to-carbon flux (Jion/JC).">(Jion/JC).(Jion/JC). The results show that, in the ranges of 5 eV⩽Eion⩽85 eV">5 eV⩽Eion⩽85 eV5 eV⩽Eion⩽85 eV and 1.1⩽Jion/JC⩽6.8,">1.1⩽Jion/JC⩽6.8,1.1⩽Jion/JC⩽6.8, the presence of defective graphite formed by subplanted C and Ar atoms, voids, and the surface roughness, are the dominant influences on the resistivity and optical absorption.

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Originally published as:

Broitman, E., Lindquist, O. P. A., Hellgren, N., Hultman, L., & Holloway, B. C. (2003). Structural, electrical, and optical properties of diamondlike carbon films deposited by dc magnetron sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 21(6), L23–L27. https://doi.org/10.1116/1.1617277

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